Jiamei Song, Biying Song, Liqi Zou, Christopher Allen, Hidetaka Sawada, Fucai Zhang, Xiaoqing Pan, Angus I Kirkland, Peng Wang，“Fast and Low-dose Electron Ptychography”，Microscopy and Microanalysis 24 (S1), 224-225（2018）

【原文】

Fast and Low-dose Electron Ptychography

ABSTRACT

In recent years, there have been many significant developments made in scanning transmission electron microscopy (STEM), notably the development of aberration correctors and complementary electron optical components such as monochromators and high brightness guns [1]. These advances have made it possible to obtain a 0.5Å resolution at 300kV for radiation resistant materials. However, spatial resolution is still limited for beam-sensitive specimen such as organics, biological specimens, zeolites and ceramics due to radiation damage. Beam-sensitive specimens have varying tolerances to electron dose due to different damage mechanisms. Although it is possible to reduce the dose in the STEM geometry by decreasing the pixel dwell time or the probe current density, a large pixel array is still needed for atomic resolution imaging and in addition manual adjustment of residual low order aberrations further increases the dose at the sample.